Influence of pH Solution on the Electrodeposition of Tungsten Oxide (WO3) Films onto Indium Tin Oxide (ITO)-glass Substrate

  • Wan Danial Shahizuan
  • Yusairie Mohd

Abstract

An investigation on the influence of pH solution on the formation of tungsten oxide (WO3) films on indium tin oxide (ITO) - coated glass substrate was carried out. The films have been electrochemically deposited from bath solution containing Na2WO4.2H2O and H2O2 at different pH values using constant potential of -0.45V vs Ag/AgCl for 300s. The surface morphology and crystalline structure of the prepared films were characterized by field emission scanning electron microscope (FESEM) and X-ray diffraction (XRD), respectively. The electrochemical behaviour of the films in 1 M HNO3 was measured by cyclic voltammetry (CV). It was observed that the morphology and electrochemical behavior of WO3 films strongly depend on pH value. A smooth and thin WO3 film was deposited on ITO from pH solution of 1.30; however, the deposition at lower pH value (i.e.: pH=0.80) under the same electrodeposition conditions has produced a porous and thick film. The porous film has greatly enhanced the electrochemical behaviour of WO3 for intercalation and deintercalation of H+ ions due to its high surface area.

Author Biographies

Wan Danial Shahizuan
Faculty of Applied Sciences, Universiti Teknologi MARA, 40450 Shah Alam,
Malaysia
Yusairie Mohd
Faculty of Applied Sciences, Universiti Teknologi MARA, 40450 Shah Alam,
Malaysia
How to Cite
Shahizuan, W. D., & Mohd, Y. (1). Influence of pH Solution on the Electrodeposition of Tungsten Oxide (WO3) Films onto Indium Tin Oxide (ITO)-glass Substrate. Journal of Science and Technology, 4(1). Retrieved from https://publisher.uthm.edu.my/ojs/index.php/JST/article/view/467
Section
Articles