Comparative Study of Infrared Nd:YAG Pulsed Laser Radiation on Pt Thin Film
AbstractThis paper investigated on infrared Nd:YAG pulsed laser radiation on platinum (Pt) thin films. Pt thin films were deposited on Si by DC magnetron sputtering. Then, the deposited thin films were radiated by infrared Nd:YAG pulse laser at different laser energy. The radiated thin films were analysed based on the electrical and surface morphological properties. Four-point probe measurement shows that, the lowest resistivity was recorded when the energy laser are 110-170 mJ. Surface morphology scanned by scanning electron microscope (SEM) revealed that the surface of sample with lowest resistivity after radiated with laser is smoother than the as-deposited thin films. After laser radiation, the grain sizes of thin films increases due to the grain agglomeration on the surface area.
Open access licenses
Open Access is by licensing the content with a Creative Commons (CC) license.
This work is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International License.